ZnO as fast scintillation devices for the next generation lithography evaluated with Ni-like Ag laser

Furukawa, Yusuke*; Murakami, Hidetoshi*; Sarukura, Nobuhiko*; Tanaka, Momoko; Nishikino, Masaharu; Nagashima, Keisuke; Kimura, Toyoaki; Yamatani, Hiroshi; Yoshikawa, Akira*; Fukuda, Tsuguo*

Using Ni-like Ag extreme ultraviolet (EUV) laser operated at 13.9-nm, ZnO is shown to be the excellent scintillator in this wavelength region with sufficiently short response time of less than 3 nsec and prominent peak fluorescence originated form exciton at 380 nm.

Language	:	English
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Meeting title	:	Nonlinear Optics: Materials, Fundamentals and Applications Topical Meeting and Tabletop Exhibit (NLO 2007)
Held date	:	2007/07
Location (city)	:	Hawaii
Location (country)	:	U.S.A.
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Keywords	:	no keyword
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Registration No. : BB20070260
JAEA Abstracts No. :
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