Oxidation reaction kinetics on Ti(0001) surface studied by real-time monitoring methods of XPS, UPS, and RHEED combined with AES

Takakuwa, Yuji*; Ogawa, Shuichi*; Ohira, Masayuki*; Ishizuka, Shinji*; Yoshigoe, Akitaka ; Teraoka, Yuden; Mizuno, Yoshiyuki*; Yamauchi, Yasuhiro*; Homma, Teiichi*

Oxidation processes of Ti(0001)-11 clean surface were analyzed by real-time monitoring using a variety of surface analysis methods of XPS, UPS, and AES/RHEED. Following conclusions were obtained by these observations. Oxide layer grows epitaxially at the Ti(0001) surface with a structure. Surface roughness changes periodically. The period is consistent with that of work function. Low oxidation state (TiO) plays a dominant role in the dissociative adsorption of oxygen molecules. The oxide layer decomposes easily at surface temperature over 673 K. The TiO $_{2}$ structure reduces to TiO during thermal decomposition.

Language	:	English
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Meeting title	:	3rd International Workshop on Oxidation Reactions
Held date	:	2007/05
Location (city)	:	Suita
Location (country)	:	Japan
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DOI for research data	:	Link to research data related to this paper/report.
Keywords	:	no keyword
Research Facility	:	SPring-8(大型放射光施設)
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Cooperating Institute	:	東北大学

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Registration No. : BB20070457
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