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Radiation hydrodynamic simulation of extreme ultra-violet emission from laser-produced tin plasmas

Sunahara, Atsushi*; Sasaki, Akira; Tanuma, Hajime*; Nishihara, Katsunobu*; Nishikawa, Takeshi*; Koike, Fumihiro*; Fujioka, Shinsuke*; Aota, Tatsuya*; Yamaura, Michiteru*; Shimada, Yoshinori*; Nishimura, Hiroaki*; Izawa, Yasukazu*; Miyanaga, Noriaki*; Mima, Kunioki*

We study the EUV emission from laser produced Sn plasmas using the 1D and 2D radiation hydrodynamics simulation, for the development of EUV source for the next generation semiconductor lithography. The opacity and emissivity of the plasma used in the simulation are calculated by a detailed atomic model, with the accurate wavelength of emission lines obtained from the detailed spectroscopic measurements. Calculation is shown to reproduce the experimental spectrum and conversion efficiency reasonably, including the effect of photo pumping which modifies the EUV emission spectrum in the case with a long scale length of the plasmas.

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