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Report No.

Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-X-ray flat-field spectrograph in the region of 1.7 keV

Imazono, Takashi; Ishino, Masahiko; Koike, Masato; Sasai, Hiroyuki*; Sano, Kazuo*

A multilayer laminar-type holographic grating having an average groove density of 2400 lines/mm is designed and fabricated for use with a soft X-ray flat field spectrograph covering the 0.70-0.75 nm region. A varied-line-spaced grooves pattern is generated by the use of an aspheric wavefront recording system and laminar-type grooves are formed by a reactive ion-etching method. Mo/SiO$$_2$$ multilayers optimized for the emission lines of hafnium M, silicon K, and tungsten M are deposited on one of the three designated areas on the grating surface in tandem. The measured first-order diffraction efficiencies at the respective centers of the areas are 18$$sim$$20%. The flat field spectrograph equipped with the grating indicates a spectral line width of 8$$sim$$14 eV for the emission spectra generated from electron-impact X-ray sources.



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