Single-domain Si(110)-162 surface fabricated by electromigration

Yamada, Yoichi; Girard, A.*; Asaoka, Hidehito  ; Yamamoto, Hiroyuki; Shamoto, Shinichi  

Micrometer-wide, single-domain of Si(110)-162 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in DC heating process is found to line-up the reconstruction rows when the current direction matches to the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110), but also a new template for low-dimensional nanostructures.