Emission measurement of solid-state material excited with a soft-X-ray laser

Tanaka, Momoko; Furukawa, Yusuke*; Sarukura, Nobuhiko*

X-ray laser is a characteristic EUV source with short pulse duration of several pico-seconds, narrow spectral width, and high coherence. As an application of the X-ray laser, the UV emission from the ZnO single crystal excited by the 13.9 nm X-ray laser was observed and evaluated for EUV scintillator. The response time is sufficiently short for characterizing EUV lithography light sources having several nanoseconds duration. It is also shown that the X-ray laser is an excellent tool for time-resolved spectroscopy and characterization of materials intended for next-generation lithography applications.

Language	:	Japanese
Journal	:	Purazuma, Kaku Yugo Gakkai-Shi
Volume	:	84
Number	:	7
Pages	:	p.443 - 445
Publication Year/Month	:	2008/07
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Paper URL	:	https://ci.nii.ac.jp/naid/110006835286
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Registration No. : AA20080164
JAEA Abstracts No. : 36001341
Paper Submission No. : 4640

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