Three-dimensional writing with ion microbeam

Takano, Katsuyoshi; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Okubo, Takeru; Sugimoto, Masaki

Three dimensional micromachining with proton beam writing has been developed at Japan Atomic Energy Agency (JAEA) Takasaki. For SU-8 negative-type photoresist films which is one of the candidate for the target, the proton microbeam writing with the incidence energy 3 MeV was performed to change the fluency from 0.03 to 0.27 C/mm. The use of the proton microbeam writing that the fluency is adjusted to 0.07C/mm enables to fabricate the range of 550 550 m by the resolution of 1 m vertically against the incidence direction.