Growth process of radio-frequency ICP plasma and sputtering behavior from antenna

Yamauchi, Toshihiko; Takemoto, Ryo*; Kanno, Yoshinori*; Kobayashi, Seiji*; Nakagaki, Keita*; Kato, Hatsuhiro*

no abstracts in English

Language	:	Japanese
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Meeting title	:	2008年秋季第69回応用物理学会学術講演会
Held date	:	2008/09
Location (city)	:	春日井
Location (country)	:	日本
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Keywords	:	no keyword
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Registration No. : BB20081518
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