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Atomic modeling of the plasma EUV sources

Sasaki, Akira; Sunahara, Atsushi*; Furukawa, Hiroyuki*; Nishihara, Katsunobu*; Nishikawa, Takeshi*; Koike, Fumihiro*; Tanuma, Hajime*

We study the radiative properties of the EUV source to address conditions to achieve an output power and efficiency required for its application to the next generation microlithography. An atomic model is developed based on the atomic data calculated by Hullac code, which is validated through detailed comparisons with experimental emission and a absorption spectra. The atomic model is improved with respect to the wavelength of the strong emission lines, and the number of satellite channels taken into account. As a result, the radiation hydrodynamics model is shown to successfully reproduce the experiments. We show Sn plasma is more efficient than Xe plasma because of the atomic number dependence of the emission wavelength, and the use of CO$$_{2}$$ lasers as a pumping source has an advantage to reduce satellite contribution and to have narrower emission spectrum to obtain higher conversion efficiency.

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Percentile:35.94

Category:Physics, Fluids & Plasmas

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