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Development of reversed shear plasmas with high bootstrap current fraction towards reactor relevant regime in JT-60U

Sakamoto, Yoshiteru; Matsunaga, Go; Oyama, Naoyuki; Suzuki, Takahiro; Aiba, Nobuyuki; Takenaga, Hidenobu; Isayama, Akihiko; Shinohara, Koji; Yoshida, Maiko; Takechi, Manabu; Fujita, Takaaki; Ide, Shunsuke; Koide, Yoshihiko; Kamada, Yutaka; JT-60 Team

This paper reports the recent development of reversed shear plasmas with a high bootstrap current fraction towards reactor relevant regime, especially lower $$q$$$$_{95}$$ regime. By utilizing large volume configuration close to the conductive wall for wall stabilization, the beta limit of the reversed shear plasmas is significantly improved. As a result, high confinement reversed shear plasmas with high bootstrap current fraction exceeding no-wall beta limit are obtained in reactor relevant regime, where $$beta$$$$_{rm N}$$ of 2.7, $$beta$$$$_{rm P}$$ of 2.3 is achieved with reversed $$q$$ profile with $$q$$$$_{rm min}$$ of 2.3, and then HH$$_{rm 98y2}$$ of 1.7, $$n$$$$_{rm e}$$/$$n$$$$_{rm GW}$$ of 0.87 and $$f$$$$_{rm BS}$$ of 0.9 are also obtained at $$q$$$$_{95}$$ of 5.3.

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Category:Physics, Fluids & Plasmas

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