X-ray devices and the possibility of applying nanophotonics

X線デバイスとナノフォトニクスへの応用

小池 雅人; 宮内 真二*; 佐野 一雄*; 今園 孝志

Koike, Masato; Miyauchi, Shinji*; Sano, Kazuo*; Imazono, Takashi

光学近接場技術に基づいた新しいリソグラフィーを用いて製作したラミナー型回折格子の表面にMo/SiO多層膜を蒸着して7600本/mmの多層膜回折格子を製作した。0.72.0nmの波長範囲で回折効率を放射光施設で測定した。その結果、溝深さ3nm,多層膜周期5.33nmの多層膜回折格子は0.70nm(1.77keV),入射角88.020度で0.032, 1.19nm(1.04keV)入射角85.230度で0.016の回折効率を示した。また、実験的,理論的な回折効率の差をDebye-Waller因子により解析を行った。

Multilayer gratings having a groove density of 7600 lines/mm have been fabricated by depositing Mo/SiO multilayer coating on the surface of laminar-type master gratings fabricated by use of a new lithography machine based on optical near field technologies. The diffraction efficiency was measured by reflectometers in the wavelength range of 0.7 - 2.0 nm at a synchrotron radiation facility. The multilayer grating having a groove depth of 3 nm and multilayer period length of 5.33 nm showed diffraction efficiencies of 0.032 at 0.70 nm (1.77 keV) and 0.016 at 1.19 nm (1.04 keV) were observed for the incidence angles of 88.020 deg and 85.230 deg, respectively. We also discuss an analysis of the roughness in terms of Debye-Waller factor comparing the experimental and theoretical diffraction efficiencies.