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Low threshold ablation of large bandgap LiF dielectrics induced by picosecond soft X-ray laser pulses

Faenov, A. Y.; Inogamov, N. A.*; Zhakhovskii, V.*; Khokhlov, V. A.*; Nishihara, Katsunobu*; Kato, Yoshiaki* ; Tanaka, Momoko; Pikuz, T.*; Kishimoto, Maki; Ishino, Masahiko; Nishikino, Masaharu; Nakamura, Tatsufumi; Fukuda, Yuji; Bulanov, S. V.; Kawachi, Tetsuya

Experimental and theoretical investigations of large bandgap LiF dielectrics ablation threshold induced by 7 ps 13.9 nm XRL pulses were performed. LiF crystal threshold is about 1600, 210 and 8 times smaller compare with LiF crystal thresholds measured previously for ns and fs visible lasers and ns 46.9 nm soft XRL, correspondently.

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