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高温水溶液中のOHラジカルの反応性とp${it K}$ $$_{a}$$評価

Reaction kinetics and p${it K}$ $$_{a}$$ value of hydroxyl radical at high temperature

室屋 裕佐*; 高橋 宏行*; 勝村 庸介; Lin, M.; 熊谷 友多   ; 工藤 久明*

Muroya, Yusa*; Takahashi, Hiroyuki*; Katsumura, Yosuke; Lin, M.; Kumagai, Yuta; Kudo, Hisaaki*

軽水炉内において冷却水は高い放射線場にあり、放射線分解で生成する酸化性生成物は構造材料の腐食促進の大きな要因となる。よって高温水の放射線分解反応を把握し制御することは重要である。分解生成物の中でも特にOHラジカル($$^{bullet}$$OH)は強力な酸化性を持った重要な化学種である。しかしその性質や反応性は、200$$^{circ}$$C以上についてはよくわかっていない。そこでパルスラジオリシス法を用いて、300$$^{circ}$$Cまでの反応性や、$$^{bullet}$$OH解離反応($$^{bullet}$$OH/O$$^{-}$$$$^{bullet}$$)のp${it K}$ $$_{a}$$値を評価した。

Water coolant in light water cooled reactors is exposed to high-dose radioactive field, and oxidant products produced in water radiolysis are significant factor to induce and accelerate corrosion of constructional materials of the reactors. Therefore, it is inevitably important to figure out and to control water radiolysis and involved reactions at elevated temperatures. Especially, hydroxyl radical ($$^{bullet}$$OH) is important species because of its the strongest oxidant property among water decomposition products. However, detailed properties and reactivity of the radical are not known well at the temperatures of 200 $$^{circ}$$C or higher. In this work, reactivity of $$^{bullet}$$OH and p${it K}$ $$_{a}$$ value for dissociative reaction between $$^{bullet}$$OH and O$$^{-}$$$$^{bullet}$$ have been evaluated up to 300 $$^{circ}$$C with pulse radiolysis technique.

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