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Low-threshold ablation of dielectrics irradiated by picosecond soft X-ray laser pulses

Faenov, A. Y.; Inogamov, N. A.*; Zhakhovskii, V. V.*; Khokhlov, V. A.*; Nishihara, Katsunobu*; Kato, Yoshiaki* ; Tanaka, Momoko; Pikuz, T. A.*; Kishimoto, Maki; Ishino, Masahiko; Nishikino, Masaharu; Nakamura, Tatsufumi; Fukuda, Yuji; Bulanov, S. V.; Kawachi, Tetsuya

Ablation of LiF crystal by soft X-ray laser pulses with wavelength 13.9 nm and duration 7 ps is studied experimentally and theoretically. It is found that a crater appears on a surface of LiF for XRL fluence, exceeding the ablation threshold 10.2 mJ/cm$$^{2}$$ in one shot, or 5 mJ/cm$$^{2}$$ in each of the three XRL shots. This is substantially below the ablation thresholds obtained with other lasers having longer pulse duration and/or longer wavelength. A new mechanism of thermomechanical ablation in large bandgap dielectrics is proposed. The theory explains the low ablation threshold via small attenuation depth, absence of light reflection, and electron heat conductivity.

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Category:Physics, Applied

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