Study of oxidation processes on TiAl by using X-ray photoemission spectroscopy in conjunction with synchrotron radiation

Hashinokuchi, Michihiro*; Sumimoto, Yuichi; Tode, Mayumi; Okada, Michio*; Harries, J.; Yoshigoe, Akitaka ; Teraoka, Yuden; Kasai, Toshio*

We have studied chemical reactions of TiAl surface with oxygen molecules by using synchrotron radiation photoelectron spectroscopy to clarify the generation process of Al oxides. The experiment was conducted with the surface chemistry experimental station (SUREAC2000) at the soft X-ray beamline (BL23SU) of Japan Atomic Energy Agency in the SPring-8 facilities. The surface (50at.%) was cleaned by Ar ion sputtering and annealing. Comparing the Al-2p and Ti-2p XPS spectra of the clean surface with those of the surface exposed to the oxygen of 350L at 673K, it has been found that the peak position and profile were changed. It shows that both Ti and Al atoms were oxidized. Moreover, the Ti oxides was decreased by heating up to 1123K.