X-ray photoemission study of oxidation process on Cu(110) surface using a hyperthermal O molecular beam

Hashinoguchi, Michihiro*; Okada, Michio*; Yoshigoe, Akitaka ; Teraoka, Yuden

We have studied the oxidation processes on Cu(100), Cu(111) and Cu(110) surfaces at room temperature using hyperthermal O molecular beam. A collision-induced absorption mechanism was proposed for the oxidation process of Cu into CuO on Cu(100) and Cu(111). On the other hand, an additional mechanism involving mobile Cu adatoms was suggested for Cu(110). Thus, surface temperature is expected to be a key factor of CuO growth on Cu(110). Here, we present surface temperature dependence of oxidation processes on Cu(110) using molecular beams and X-ray photoemission spectroscopy in conjunction with synchrotron radiation. All experiments were performed with the surface reaction analysis apparatus constructed at BL23SU in SPring-8. We observed the efficient oxide formation on Cu(110) at 473 K in comparison with 300 K for the 2.2 eV incidence.