Electron optical injection with head-on and countercrossing colliding laser pulses

正面衝突及び斜め衝突レーザーパルスによる光電子入射

小瀧 秀行; 大東 出; 神門 正城; 林 由紀雄; 川瀬 啓悟; 亀島 敬*; 福田 祐仁; 本間 隆之; Ma, J.*; Chen, L. M.*; Esirkepov, T. Z.; Pirozhkov, A. S.; Koga, J. K.; Faenov, A. Y.; Pikuz, T.*; 桐山 博光; 岡田 大; 下村 拓也; 中井 善基; 田上 学*; 笹尾 一; 若井 大介*; 松浦 英紀*; 近藤 修司; 金沢 修平; 杉山 僚; 大道 博行; Bulanov, S. V.

Kotaki, Hideyuki; Daito, Izuru; Kando, Masaki; Hayashi, Yukio; Kawase, Keigo; Kameshima, Takashi*; Fukuda, Yuji; Homma, Takayuki; Ma, J.*; Chen, L. M.*; Esirkepov, T. Z.; Pirozhkov, A. S.; Koga, J. K.; Faenov, A. Y.; Pikuz, T.*; Kiriyama, Hiromitsu; Okada, Hajime; Shimomura, Takuya; Nakai, Yoshiki; Tanoue, Manabu*; Sasao, Hajime; Wakai, Daisuke*; Matsuura, Hideki*; Kondo, Shuji; Kanazawa, Shuhei; Sugiyama, Akira; Daido, Hiroyuki; Bulanov, S. V.

A high stability electron bunch is generated by laser wakefield acceleration with the help of a colliding laser pulse. The wakefield is generated by a laser pulse; the second laser pulse collides with the first pulse at 180 and at 135 realizing optical injection of an electron bunch. The electron bunch has high stability and high reproducibility compared with single pulse electron generation. In the case of 180 collision, special measures have been taken to prevent damage. In the case of 135 collision, since the second pulse is counter-crossing, it can not damage the laser system.