Study on direct etching of fluoropolymers by heavy ion beam irradiation

重イオン照射によるフッ素系高分子の直接加工

高澤 侑也*; 福武 直之*; 高橋 朋宏*; 裏川 達也*; 大島 雄二*; 五輪 智子*; 白木 文也*; 藤田 創*; 岡 壽崇   ; 村上 健*; 大島 明博*; 濱 義昌*; 鷲尾 方一*

Takasawa, Yuya*; Fukutake, Naoyuki*; Takahashi, Tomohiro*; Urakawa, Tatsuya*; Oshima, Yuji*; Gowa, Tomoko*; Shiraki, Fumiya*; Fujita, Hajime*; Oka, Toshitaka; Murakami, Takeshi*; Oshima, Akihiro*; Hama, Yoshimasa*; Washio, Masakazu*

Fluoropolymers such as PTFE, PFA and FEP were irradiated with heavy ion beam from Medium Energy Beam Port at Heavy Ion Medical Accelerator in Chiba (HIMAC) in NIRS. The direct etching for fluoropolymers was succeeded by various heavy ion beam irradiation, and the etching rates increased with increasing linear energy transfer (LET).