Study of oxidation processes on TiAl by using X-ray photoemission spectroscopy in conjunction with synchrotron radiation

Hashinokuchi, Michihiro*; Sumimoto, Yuichi; Tode, Mayumi; Harries, J.; Teraoka, Yuden; Okada, Michio*; Kasai, Toshio*

The oxidation processes on TiAl are complex and the composition of the oxide layer depends on various oxidation parameters like sample temperature and oxygen pressure. Therefore, the aim of this work was to examine the initial stages of oxidation of TiAl under different oxidation temperatures and the different kinetic energy of incident oxygen by using X-ray photoemission spectroscopy in conjunction with synchrotron radiation. All experiments were performed with a surface reaction analysis apparatus (SUREAC2000) constructed in BL23SU at SPring-8. The TiAl sample was cleaned by repeatedly argon ion sputtering and annealing. The Oxygen molecules were dosed on the TiAl by hyperthermal oxygen molecular beams or by backfilling oxygen gas.