Experimental determination of effective attenuation length for SiO thin film with synchrotron radiation phottoemission spectroscopy

Inoue, Keisuke; Teraoka, Yuden

The effective attenuation length (EAL) is a necessary parameter to estimate the thickness of SiO overlayer by X-ray photoemission spectroscopy (XPS). Inelastic mean free path (IMFP) is often used instead of EAL because EAL is scarcely known. EAL values were determined experimentally in the photon energy region from 480 eV to 800 eV using synchrotron radiation photoemission spectroscopy. Although EALs estimated are different from calculated IMFPs, EALs, estimated without suboxides, are mostly close to theoretically-calculated IMFPs.

Language	:	Japanese
Journal	:	Denki Gakkai Rombunshi, C
Volume	:	130
Number	:	10
Pages	:	p.1817 - 1818
Publication Year/Month	:	2010/10
Meeting title	:
Held date	:
Location (city)	:
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1541/ieejeiss.130.1817
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	SPring-8(大型放射光施設)
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:
Altmetrics	:

Registration No. : AA20090855
JAEA Abstracts No. : 39000069
Paper Submission No. : 8306

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.