Design of the pulse bending magnet for switching the painting area between the MLF and MR in J-PARC 3-GeV RCS

Takayanagi, Tomohiro   ; Yoshimoto, Masahiro  ; Watanabe, Masao  ; Saha, P. K.   ; Ueno, Tomoaki; Togashi, Tomohito; Yamazaki, Yoshio ; Kinsho, Michikazu  ; Fujimori, Hiroshi*; Irie, Yoshiro*

It has been designed the pulse bending magnet for switching the painting area to the MLF and MR, which is located in injection line area in J-PARC 3-GeV RCS. After upgrading the linac energy to 400 MeV, the two pulse magnets switch the injection beam orbit to change the each painting area by each shot of 25 Hz. The magnetic field strength switching by 25 Hz are required for the painting injection. Furthermore, in the case of the beam commissioning of the 3-GeV RCS, the center injection is performed. Therefore, the wide range of the beam bending angle from 3 mrad to 38 mrad is required for the pulse magnets.