Surface depth profiling of FeSi $_{2}$ single crystals by synchrotron radiation excited XPS and XAS

Esaka, Fumitaka ; Yamamoto, Hiroyuki; Udono, Haruhiko*; Matsubayashi, Nobuyuki*; Yamaguchi, Kenji; Shamoto, Shinichi ; Magara, Masaaki ; Kimura, Takaumi

Surface depth profiling of FeSi $_{2}$ single crystals has been performed by synchrotron radiation excited XPS and XAS.

Language	:	English
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Meeting title	:	18th International Vacuum Congress (IVC-18)/International Conference on Nanoscience and Technology (ICN+T 2010)/14th International Conference on Surfaces Science (ICSS-14)/Vacuum and Surface Sciences Conference of Asia and Australia (VASSCAA-5)
Held date	:	2010/08
Location (city)	:	Beijing
Location (country)	:	China
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Keywords	:	no keyword
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Registration No. : BB20100677
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Surface depth profiling of FeSi single crystals by synchrotron radiation excited XPS and XAS

Surface depth profiling of FeSi $_{2}$ single crystals by synchrotron radiation excited XPS and XAS