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レーザー生成XUV光源の放射物理と将来の短波長化への展望

Physics and future of the laser pumped plasma XUV sources

佐々木 明; 西原 功修*

Sasaki, Akira; Nishihara, Katsunobu*

レーザー励起EUV光源の短波長化の可能性について議論する。Sn光源で用いられる4d-4f+4p-4d遷移の原子物理,原子過程について検討し、ターゲット物質としてGdを用いることで、波長6.5nmまで短波長化できることを示す。計算された輻射輸送係数を用い、等温膨張プラズマを仮定したパワーバランスモデルにより、Gdでも高い効率が得られるが、照射レーザー強度はSn光源の場合よりも10倍以上必要なことがわかった。光源の特性の評価を行うための、理論モデルの課題についても述べる。

Extension of the laser pumped plasma (LPP) EUV source toward shorter wavelength is discussed. Properties of the emission from the 4d-4f + 4p-4d transition array of 4d open-shell ions, which has been used for the lithographic EUV source at $$lambda$$=13.5nm using Sn target, are investigated. Using calculated emissivity, opacity, and spectral efficiency, the conversion efficiency (CE) for each ion at their characteristic emission wavelength is investigated, showing the LPP can be scalable down to $$lambda$$=6.5nm using Gd target, even the estimated irradiation intensity of $$10^{11} rm W/cm^2$$ demands considerable improvement of laser technologies. Possibility and further requirement to the theoretical method for the prediction of the performance of LPP EUV source are also discussed.

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