Microbeam complex at TIARA; Technologies to meet a wide range of applications

Kamiya, Tomihiro; Takano, Katsuyoshi; Sato, Takahiro; Ishii, Yasuyuki; Nishikawa, Hiroyuki*; Seki, Shu*; Sugimoto, Masaki; Okumura, Susumu; Fukuda, Mitsuhiro*

In order to meet wide variety of ion beam applications, three different types of ion microbeam systems were developed. These systems have shown the spatial resolutions of less than 1 m and have made it possible to irradiate minute targets or areas with positioning accuracies of less than 1 m. For micro-analyses, an in-air micro-PIXE system was originally developed on the light ion microbeam system. For micro-fabrication, technique of mask-less ion beam lithography was developed on the light-ion microbeam and other systems. Single-ion-hit technique was also realized to study single-event phenomena in semiconductors or biological cells induced by high-energetic heavy particles. On the other hand, the qualities of the beam from accelerators were important, such as stability of the intensity and the energy of the beams. In this paper, the latest progress and a future prospect of them were discussed.