Development of new beam technologies at TIARA

Tanaka, Shigeru; Yokota, Wataru; Kamiya, Tomihiro

Beam technologies newly developed at TIARA after the establishment of JAEA in October, 2005 are reviewed. In chapter 2, the technology for micro beam formation of heavy ions at energies of a few hundreds of MeV from AVF cyclotron, using flat-top acceleration technique and the technology of fast automatic aiming single ion hitting system by heavy ions at energies of a few hundreds of MeV, are described. In chapter 3, the technologies for micro-nano beam formation of ions at energies of a several MeV from electro-static accelerators and their application to micro fabrication of materials are firstly described, the development of in-air micro PIXE technique and its application are secondly explained, and then research and development of cluster ion beams and their application are described in detail.