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Modeling of atomic processes of multiple charged ions in plasmas and its application to the study of EUV light sources

多価電離イオンの原子過程のモデリングとそのEUV光源の解析への応用

佐々木 明; 西原 功修*; 砂原 淳*; 古河 裕之*; 西川 亘*; 小池 文博*

Sasaki, Akira; Nishihara, Katsunobu*; Sunahara, Atsushi*; Furukawa, Hiroyuki*; Nishikawa, Takeshi*; Koike, Fumihiro*

多電子,多価電離イオンの原子過程,輻射輸送過程は、核融合装置においてはプラズマ壁相互作用や不純物輸送の観点で興味を持たれているが、波長13.5nmのEUV領域での発光は、次世代半導体リソグラフィ技術でも注目されている。Snイオンの4p-4d+4d-4f遷移で強い発光が得られ、その特性の理論的,実験的な最適化が行われているほか、GdやTbイオンを用い、波長6.5nmでも効率的な光源の実現可能性が理論的に示されている。プラズマからの放射強度、スペクトルの正確な評価のために必要な、原子物理コード、衝突輻射モデルの今後の研究課題についても述べる。

Atomic processes and radiation from multiple charged ions in plasmas are of the interest in the investigation of plasma wall interaction and transport of impurity ions in the fusion devices. The emission from multiple charged ions is also investigated for the development of extreme ultra violet light (EUVL) sources at $$lambda=13.5 nm$$. Efficient emission through the 4d-4f + 4p-4d transition array is obtained from tin ions. An optimization of pumping conditions of laser produced plasma sources is carried out theoretically and experimentally. We also investigate an extension of the plasma light sources to short wavelength to $$lambda=6.5 nm$$ using Gd and Tb plasmas. We discuss requirements to the atomic structure, rate coefficient and collisional radiative codes to determine ion abundance and level population as a function of plasma temperature and density, to calculate the radiation intensity as well as emission spectrum.

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