Secondary ion counting for surface-sensitive chemical analysis of organic compounds using time-of-flight secondary ion mass spectroscopy with cluster ion impact ionization

クラスターイオン衝突イオン化による飛行時間質量分析法を用いた有機化合物の表面化学分析のための2次イオン計測

平田 浩一*; 齋藤 勇一; 千葉 敦也; 山田 圭介; 高橋 康之*; 鳴海 一雅

Hirata, Koichi*; Saito, Yuichi; Chiba, Atsuya; Yamada, Keisuke; Takahashi, Yasuyuki*; Narumi, Kazumasa

We report suitable secondary ion (SI) counting for surface-sensitive chemical analysis of organic compounds using time-of-flight (TOF) SI mass spectroscopy, based on considerably higher emission yields of SIs induced by cluster ion impact ionization. A SI counting system for a TOF SI mass spectrometer was developed using a fast digital storage oscilloscope, which allows us to perform various types of analysis as all the signal pulses constituting TOF SI mass spectra can be recorded digitally in the system. Effects of the SI counting strategy on SI mass spectra were investigated for C and C cluster ion impacts on an organically contaminated silicon wafer and on polytetrafluoroethylene targets by comparing TOF SI mass spectra obtained from the same recorded signals with different SI counting procedures. Our results show that the use of a counting system, which can cope with high SI yields is necessary for quantitative analysis of SI mass spectra obtained under high SI yield per impact conditions, including the case of cluster ion impacts on organic compounds.