Low-energy-electron-diffraction and X-ray-phototelectron-spectroscopy studies of graphitization of 3C-SiC(111) thin film on Si(111) substrate

Si(111)基板における3C-SiC(111)薄膜炭素化の低エネルギー電子回折法及びX線光電子分光法による研究

高橋 良太*; 半田 浩之*; 阿部 峻佑*; 今泉 京*; 吹留 博一*; 吉越 章隆 ; 寺岡 有殿; 末光 眞希*

Takahashi, Ryota*; Handa, Hiroyuki*; Abe, Shunsuke*; Imaizumi, Kei*; Fukidome, Hirokazu*; Yoshigoe, Akitaka; Teraoka, Yuden; Suemitsu, Maki*

Epitaxial graphene can be formed on silicon substrates by annealing a 3C-SiC film formed on a silicon substrate in ultrahigh vacuum (G/3C-SiC/Si). In this work, we explore the graphitization process on the 3C-SiC(111)/Si(111) surface by using low-energy electron diffraction and X-ray photoelectron spectroscopy (XPS) and compare them with that on 6H-SiC(0001). Upon annealing at substrate temperature higher than 1423 K, the 3C-SiC(111)/Si(111) surface follows the sequence of ()R30, (66)R30 and (11) in the surface structures. The C 1s core level according to XPS indicates that a buffer layer, identical with that in G/6H-SiC(0001), exists at the G/3C-SiC(111) buffer. These observations strongly suggest that graphitization on the surface of the 3C-SiC(111) face proceeds in a similar manner to that on the Si-terminated hexagonal bulk SiC crystals.