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A Diagnosis of intense ion beam by CR-39 detectors analyzing the back scattered particles

Kanasaki, Masato; Yamauchi, Tomoya*; Fukuda, Yuji; Sakaki, Hironao; Hori, Toshihiko*; Tampo, Motonobu; Kurashima, Satoshi; Kamiya, Tomihiro; Oda, Keiji*; Kondo, Kiminori

A new diagnosis method has been developed utilizing back scattered particles for high energy intense ion beams. The CR-39 detector mounted on the uniform back-scatterer was irradiated with $$^{4}$$He$$^{2+}$$ ions with an energy 25 MeV/n, which is never recorded as etchable track in CR-39. We found that it is possible to diagnose the high energy intense ion beams by analyzing the etch pits created on the rear surface of CR-39 that directly contacted on the back-scatterers. It turns out that most of etch pits in the rear surface are made by the backscattered particles through the investigation of the growth pattern of each etch pit with multi-step etching technique. This method allows simple diagnosis of the ion beam profile and the presence of high energy component of ions beyond the detection threshold limit of the CR-39 in mixed radiation fields such as laser-driven ion acceleration experiments.

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