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Survivability of silicon-doped diamond-like carbon films in energetic atomic/molecular oxygen beam environments

エネルギーを持った酸素の原子・分子ビーム照射環境におけるシリコンドープダイヤモンドライクカーボン薄膜の耐損傷性

田川 雅人*; 岸田 和博*; 横田 久美子*; 松本 康司*; 吉越 章隆; 寺岡 有殿; Zhang, J.*; Minton, T. K.*

Tagawa, Masahito*; Kishida, Kazuhiro*; Yokota, Kumiko*; Matsumoto, Koji*; Yoshigoe, Akitaka; Teraoka, Yuden; Zhang, J.*; Minton, T. K.*

Volatile products were measured from two types of diamond-like carbon films under the hyperthermal atomic oxygen (AO) beam bombardment. It was clearly observed that CO and CO$$_{2}$$ were formed at the conventional hydrogenated DLC surface by hyperthermal AO beam exposure. Desorption rates of CO and CO$$_{2}$$ are constant with AO fluence which reflects the constant erosion rate of the hydrogenated DLC. In contrast, Si-doped DLC shows decrease in amount of CO and CO$$_{2}$$ with increasing AO fluence. Oxidation of Si atoms at the DLC surface was detected by X-ray photoelectron spectroscopy. This is the evidence that SiO$$_{2}$$ film formed at the DLC surface could prevent AO reaction with C atoms in DLC which leads to loss of DLC. Since a self-healing capability can be expected on Si-doped DLC, metal doping is a promising technology for space application of DLC.

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