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Pore size and shape control of fluoropolymer-based ion-track membranes; Direct use of irradiation effect

Yamaki, Tetsuya; Nuryanthi, N.*; Koshikawa, Hiroshi; Sawada, Shinichi; Hakoda, Teruyuki; Hasegawa, Shin; Asano, Masaharu; Maekawa, Yasunari; Voss, K.-O.*; Trautmann, C.*

We investigated the track-structure-dependent pore formation by scanning electron microscopy and conductometry to control the pore size and shape by direct use of the irradiation effect. PVDF films of 25 and 100 $$mu$$m thicknesses were bombarded with heavy ions in the energy range between a few hundred MeV and GeV, and then etched in a 9 M KOH aqueous solution at 80$$^{circ}$$C. A very low bulk-etch rate was seen because of the mild etching conditions and high chemical stability of pristine PVDF. This finding suggests that the differences in the track structure, mainly depending on the LET, would be the most crucial factor of the resulting pore size. The depth distribution of the LET was applied to control the pore shape, in other words, to prepare nanopores with a conical as well as cylindrical shape. Importantly, direct use of the ion-beam irradiation effect without any concern for etching conditions provided this controllability.

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