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Report No.

Three dimensional nano-micro processing for polymer films by MeV ion beam lithography

Takano, Katsuyoshi*; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shu*; Sato, Takahiro; Kamiya, Tomihiro; Ishii, Yasuyuki; Okubo, Takeru; Koka, Masashi; Kada, Wataru; Sugimoto, Masaki; Nishikawa, Hiroyuki*

The fine strings of epoxy-resin were fabricated using a focused MeV ion beam in this paper. This fabrication was carried out by the following four steps. Firstly, an epoxy-resin layer was spin-coated on a epoxy-resin film cured by electron beam irradiation as a substrate. Secondly, bridge patterns were irradiated on the epoxy-resin layer by Proton Beam Writing two times with the two different energies which led its proton beam to the two different penetration depths. Thirdly, focused 520 MeV $$^{40}$$Ar$$^{14+}$$ particles were irradiated at aiming the bridge patterns, controlling a spot pattern. Finally, the development of the irradiated epoxy-resin files was carried out using the supercritical carbon dioxide fluid, CO$$_2$$ to etch the non-irradiated area under reducing the surface tension among areas of sub-micrometer size. The epoxy-resin fine strings with the diameter of 0.8 $$mu$$m was observed between the bridge structure with the height of 20 $$mu$$m and the substrate using a scanning electron microscope. A microprocessing for fine strings of a epoxy-resin was demonstrated using a focused several hundred MeV ion beam.



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