-lactic acid) using electron beam nanoimprint lithographyOkubo, Satoshi*; Nagasawa, Naotsugu; Kobayashi, Akinobu*; Oyama, Tomoko*; Taguchi, Mitsumasa; Oshima, Akihiro*; Tagawa, Seiichi*; Washio, Masakazu*
Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 
C.
Language |
: | English |
|---|---|---|
Journal |
: | |
Volume |
: | 5 |
Number |
: | 2 |
Pages |
: | p.027303_1 - 027303_3 |
Publication Year/Month |
: | 2012/02 |
Paper URL |
: |
|
Keywords |
: | no keyword |
Research Facility |
: | |
Article of JAEA R&D Review |
: | Development of a Microfabrication Technique for Utilization of Environmentally Friendly Plastics; Micro-/Nano-Fabrication of Crosslinked Poly( |
Cooperating Institute |
: |
Accesses |
: |
- Accesses |
|---|---|---|
InCites™ |
: |
Percentile:18.19 Category:Physics, Applied |
Altmetrics |
: |
[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.
-lactic acid) Using EB Nanoimprint Lithography[