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Report No.

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Takano, Katsuyoshi*; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shu*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Koka, Masashi; Okubo, Takeru; Sugimoto, Masaki; Nishikawa, Hiroyuki*

The proton beam writing (PBW) with energy of several MeV ranges is a unique tool of three-dimensional microprocessing for a polymer material. Three-dimensional structures like a bridge structure can be fabricated by the double exposures of PBW with two deferent energies followed by the one-time development using etching solution. In this study, the fabrication of an arched bridge was attempted by means of the supercritical drying with liquid carbon dioxide to a SU-8 photoresist film, as the polymer material, coated on a substrate of epoxy sheet, after the PBW process. In the exposures, two patterns of bridge girders and piers were written with 0.5 and 3 MeV proton beams to the SU-8 photoresist films, respectively. After these writings, the photoresist films were developed with the solution of diacetone alcohol and rinsed with the solution of isopropyl alcohol. Then the supercritical drying with liquid carbon dioxide was used at 12 MPa, 40$$^{circ}$$C. As the results, the bridge structures with curved girders to the vertical direction were formed due to the swelling effect of the photoresist film on the drying. In the conference, the microprocessing method of the bridge structure and the swelling effect of the photoresist film will be represented in detail.



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Category:Polymer Science



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