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Report No.

Three dimensional microprocessing for polymer films by mev ion beam lithography

Takano, Katsuyoshi*; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shuhei*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Koka, Masashi; Okubo, Takeru; Kada, Wataru; Sugimoto, Masaki; Nishikawa, Hiroyuki*

A three-dimensional micro-structure with upstanding nanowires was fabricated on the basis of the nano- and micro-processing technique developed as a new method of ion beam lithography employing a series of irradiations on epoxy films, (a) microbeam scanning with two different energies of a few MeV and (b) single heavy ion hits with several hundred MeV energy. Demonstration of fabricating a girder-bridge and pillars for support of upstanding nanowires was made as follows: the pattern of the girder-bridge and pillars was drawn using irradiation (a), the pattern on single-dots for nanowires was superimposed on the girder-bridge pattern using irradiation (b), and development of the irradiated sample by etching solution. The upstanding nanowires between the epoxy substrate and the girder bridge were successfully fabricated and observed using SEM.



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