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Ion-track membranes of fluoropolymers; LET-dependent track etching allows controlling pore size and shape

Yamaki, Tetsuya; Nuryanthi, N.*; Koshikawa, Hiroshi; Asano, Masaharu; Sawada, Shinichi; Maekawa, Yasunari; Voss, K.-O.*; Trautmann, C.*; Neumann, R.*

Ion-track membranes of poly(vinylidene fluoride) (PVDF), a type of fluoropolymer, have been used for many applications due to its superior chemical and mechanical properties. In order to produce track-etched pores in PVDF films, a highly-concentrated alkaline solution with an oxidizing agent has mostly been used at a high temperature, yet this provides irreversible chemical damage over the entire film including the non-irradiated part. We have independently employed much milder etching conditions without any oxidant additives in the alkaline etching solution. Because of the resulting negligibly-slow bulk etching, the finally-reaching plateau pore diameter could depend solely on the dose (or damage) distribution in each track. Therefore, we investigated here the effect of the track structure on etching behavior using different bombarding ions, and our finding on LET-sensitive track etching was applied to size and shape control of the obtained pores.

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