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Report No.

Nanoparticle formation by tungsten ion implantation in glassy carbon

Kato, Sho; Yamaki, Tetsuya; Yamamoto, Shunya; Hakoda, Teruyuki; Kawaguchi, Kazuhiro; Kobayashi, Tomohiro*; Suzuki, Akihiro*; Terai, Takayuki*

Nanoparticles were formed by 100 keV tungsten-ion implantation in unpolished glassy carbon substrates at nominal fluences of $$2.4times10^{16}$$ - $$1.8times10^{17}$$ ions/cm$$^2$$. The implanted samples were analyzed by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, hydrodynamic voltammetry using a rotating disk electrode, and field emission scanning electron microscopy. A significant sputtering effect changed the depth profile during the course of irradiation and limited the amount of tungsten retainable in the substrate in agreement with our calculated distributions. The nanoparticles were composed of tungsten carbide and dispersed uniformly with diameters of around 10 nm.



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