Nanoparticle formation by tungsten ion implantation in glassy carbon

Kato, Sho; Yamaki, Tetsuya; Yamamoto, Shunya; Hakoda, Teruyuki; Kawaguchi, Kazuhiro; Kobayashi, Tomohiro*; Suzuki, Akihiro*; Terai, Takayuki*

Nanoparticles were formed by 100 keV tungsten-ion implantation in unpolished glassy carbon substrates at nominal fluences of $2.4times10^{16}$ - $1.8times10^{17}$ ions/cm. The implanted samples were analyzed by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, hydrodynamic voltammetry using a rotating disk electrode, and field emission scanning electron microscopy. A significant sputtering effect changed the depth profile during the course of irradiation and limited the amount of tungsten retainable in the substrate in agreement with our calculated distributions. The nanoparticles were composed of tungsten carbide and dispersed uniformly with diameters of around 10 nm.

Language	:	English
Journal	:	Transactions of the Materials Research Society of Japan
Volume	:	38
Number	:	1
Pages	:	p.81 - 84
Publication Year/Month	:	2013/03
Meeting title	:	International Union of Materials Research Societies; International Conference on Electronic Materials 2012 (IUMRS-ICEM 2012)
Held date	:	2012/09
Location (city)	:	Yokohama
Location (country)	:	Japan
Patent information	:
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Paper URL	:	https://doi.org/10.14723/tmrsj.38.81
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
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Article of JAEA R&D Review	:
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Registration No. : BB20121944
JAEA Abstracts No. : 41000817
Paper Submission No. : 12690

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