Negative effect of crystallization on the mechanism of laser damage in HfO $_{2}$ /SiO $_{2}$ multilayer

Tateno, Ryo*; Okada, Hajime; Kosuge, Atsushi ; Nagashima, Keisuke; Sugiyama, Akira; Kashiwagi, Kunihiro*

Elucidation for the mechanism of laser damage is indispensable to realize a high resistance mirror for the ultra-short pulse high intense lasers of the next generation. In this study, the surface and a section of a laser-damaged area of a laser mirror were observed with a laser microscope and a transmission electron microscope (cross-sectional TEM), respectively. A grain boundary of HfO $_{2}$ microcrystal was observed in the damaged area. This observation, and an evaluation of the mirror's damage resistance showed that the formation of crystals in the multilayer mirror is one of the major determinants of damage resistance.

Language	:	English
Journal	:
Volume	:
Number	:
Pages	:
Publication Year/Month	:
Meeting title	:	17th Microoptics Conference (MOC '11)
Held date	:	2011/10
Location (city)	:	Sendai
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:
DOI for research data	:
Keywords	:	no keyword
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:	島津製作所

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:
Altmetrics	:

Registration No. : BB20121883
JAEA Abstracts No. :
Paper Submission No. :

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.

Negative effect of crystallization on the mechanism of laser damage in HfO/SiO multilayer

Negative effect of crystallization on the mechanism of laser damage in HfO $_{2}$ /SiO $_{2}$ multilayer