Refine your search:     
Report No.
 - 

Preparation of tungsten carbide nanoparticles by ion implantation and electrochemical etching

Kato, Sho; Yamaki, Tetsuya; Yamamoto, Shunya; Hakoda, Teruyuki; Kawaguchi, Kazuhiro; Kobayashi, Tomohiro*; Suzuki, Akihiro*; Terai, Takayuki*

We implanted 100 keV W$$^+$$ in unpolished GC substrates at nominal fluences up to $$1.7times10^{17}$$ ions/cm$$^2$$. The implanted samples were electrochemically anodized in a NaOH aqueous solution to etch the surface layer. The analyses were performed by X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectrometry (RBS), and transmission electron microscopy (TEM). XPS W 4f spectra indicated the formation of carbides as reported previously. The electrochemical etching clearly increased the W concentration on the surface. According to the RBS results, half of the implanted W atoms were retained in the substrate, while the rest should escape to the etching solution. The cross-sectional TEM image revealed a uniform distribution of WC particles with a diameter of less than 10 nm just near the surface region.

Accesses

:

- Accesses

InCites™

:

Percentile:0.01

Category:Instruments & Instrumentation

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.