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Report No.

LET dependence of gate oxide breakdown of SiC-MOS capacitors due to single heavy ion irradiation

Deki, Manato; Makino, Takahiro; Tomita, Takuro*; Hashimoto, Shuichi*; Kojima, Kazutoshi*; Oshima, Takeshi

Metal-Oxide-Semiconductor (MOS) capacitors fabricated on Silicon Carbide (SiC) under applied biases were irradiated with heavy ions. The relationship between critical electric field (E$$_{rm CR}$$) and Linear Energy Transfer (LET) was investigated. As a results of 9 MeV-Ni, 18 MeV-Ni, Kr-322 MeV and 454 MeV-Xeirradiation (the values of LET are 14.6, 23.8, 42.2 and 73.2 MeV cm$$^{2}$$/mg, respectively), reciprocal value of E$$_{rm CR}$$ increases with increasing LET. The similar relationship was also reported Si MOS capacitors. However, the increase in SiC MOS capacitors is smaller than that in Si ones because the generation energy of one electron-hole pair for SiC is larger than that for Si.



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