Origin of non-uniformity of the source plasmas in JT-60 negative ion source

Yoshida, Masafumi; Hanada, Masaya; Kojima, Atsushi; Inoue, Takashi; Kashiwagi, Mieko; Grisham, L. R.*; Akino, Noboru; Endo, Yasuei; Komata, Masao; Mogaki, Kazuhiko; Nemoto, Shuji; Ozeki, Masahiro; Seki, Norikatsu; Sasaki, Shunichi; Shimizu, Tatsuo; Terunuma, Yuto

Distributions of H and H in the source plasmas produced at the end-plugs of JT-60 negative ions source were measured by Langmuir probes and emission spectroscopy in order to experimentally investigate the cause of lower density of the negative ions extracted from end-plugs in the source. Densities of H and H in end-plugs of the plasma grid in the source were compared with those in the center regions. As a result, lower density of the negative ion at the edge was caused by lower beam optics due to lower and higher density of the H and H.