Time-of-flight secondary ion mass spectrometry with energetic cluster ion impact ionization for highly sensitive chemical structure characterization

高感度化学構造分析のための高エネルギークラスターイオン衝突イオン化による2次イオン質量飛行分析法

平田 浩一*; 齋藤 勇一; 千葉 敦也; 山田 圭介; 鳴海 一雅

Hirata, Koichi*; Saito, Yuichi; Chiba, Atsuya; Yamada, Keisuke; Narumi, Kazumasa

Secondary ion mass spectrometry (SIMS) is one of the most powerful tools for surface analysis. Use of a time-of-flight (TOF) mass spectrometry for SIMS is advantageous in efficiently detecting secondary ions at a wider range of mass to charge ratio. We have studied on TOF-SIMS utilizing cluster ions as primary ions. Their Energy dependence to the yield of secondary ions from organic thin films was obtained in the energy range up to MeV order. As a result, it was revealed that the secondary-ion yields for organic material increased with increasing incident cluster energy in the range. This shows that cluster impacts with the energy range of up to MeV order are useful in TOF-SIMS to be applied to the high sensitive analysis of surface for organic materials.