Nanoparticle formation by tungsten ion implantation in glassy carbon

Kato, Sho; Yamaki, Tetsuya; Yamamoto, Shunya; Hakoda, Teruyuki; Kawaguchi, Kazuhiro*; Kobayashi, Tomohiro*; Suzuki, Akihiro*; Terai, Takayuki*

In this research, we prepared WC nanoparticles by tungsten ion implantation in glassy carbon. The GC plates were implanted with 100-keV tungsten ion at nominal fluences between 2.410 1.810 ions/cm by the Ion Implanter in TIARA. According to the Rutherford backscattering measurements, the implanted tungsten was distributed from 10 to 25 nm under the surface. The implanted samples were electrochemically etched to make the tungsten implanted layer exposed on the surface. The binding energy of W4f obtained by X-ray photoelectron spectroscopy were 32.1 eV, which indicated the formation of WC as expected. The transmission electron microscope observation revealed that nanoparticles formation with diameters of less than 10 nm.