Resonant inelastic X-ray scattering study of intraband charge excitations in hole-doped high- cuprates

Wakimoto, Shuichi ; Ishii, Kenji; Kimura, Hiroyuki*; Ikeuchi, Kazuhiko*; Yoshida, Masahiro*; Adachi, Tadashi*; Casa, D.*; Fujita, Masaki*; Fukunaga, Yasushi*; Gog, T.*; Koike, Yoji*; Mizuki, Junichiro; Yamada, Kazuyoshi*

We have performed resonant inelastic X-ray scattering (RIXS) near the Cu- edge on various cuprate superconductors, covering underdoped to heavily overdoped regimes and focusing on charge excitations inside the charge-transfer gap. RIXS measurements with = 9.003 keV on metallic La $_{1.7}$ Sr $_{0.3}$ CuO $_{4}$ and Bi $_{1.76}$ Pb $_{0.35}$ Sr $_{1.89}$ CuO $_{6+delta}$ exhibit a dispersive intraband excitation below 4 eV, similar to that observed in the electron-doped Nd $_{1.85}$ Ce $_{0.15}$ CuO $_{4}$ . This is the first observation of a dispersive intraband excitation in a hole-doped system, evidencing that both electron- and hole-doped systems have a similar dynamical charge correlation function.

Language	:	English
Journal	:	Physical Review B
Volume	:	87
Number	:	10
Pages	:	p.104511_1 - 104511_7
Publication Year/Month	:	2013/03
Meeting title	:
Held date	:
Location (city)	:
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1103/PhysRevB.87.104511
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	SPring-8(大型放射光施設)
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:43.41 Category:Materials Science, Multidisciplinary
Altmetrics	:

Registration No. : AA20121083
JAEA Abstracts No. : 41000685
Paper Submission No. : 12476

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.