Evaluation of radiation tolerance of phase-locked loops fabricated in 0.2-m FD-SOI process

Hoshino, Eijiro*; Shibata, Yuichi*; Kobayashi, Daisuke*; Kakehashi, Yuya*; Makino, Takahiro; Oshima, Takeshi; Hirose, Kazuyuki*

no abstracts in English

Language	:	Japanese
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Meeting title	:	2013年電子情報通信学会ソサイエティ大会
Held date	:	2013/09
Location (city)	:	福岡
Location (country)	:	日本
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Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
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Article of JAEA R&D Review	:
Cooperating Institute	:	宇宙航空研究開発機構

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Registration No. : BB20131093
JAEA Abstracts No. :
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