Comparison of the pulsed power supply systems using the PFN switching capacitor method and the IGBT chopping method for the J-PARC 3-GeV RCS injection system

Takayanagi, Tomohiro   ; Ueno, Tomoaki; Horino, Koki; Togashi, Tomohito; Hayashi, Naoki  ; Kinsho, Michikazu  ; Irie, Yoshiro*

Each pulse power supply of the bending magnets at the J-PARC 3-GeV RCS injection area has been designed and manufactured for the painting injection in the transverse plane. The shift bump and pulse steering magnets generate a trapezoidal waveform, the flat-top part of which is used for beam injection. The horizontal and vertical painting bump magnets dynamically change the beam orbit using a decaying waveform. The PFN switching capacitor system does not produce a current ripple at the flat top, although the IGBT chopping system cannot be free from ripple generation due to switching. However, the IGBT chopping system has an advantage of producing an arbitrary wave pattern as required. This paper summarizes the comparison of both power supply system from view point of the circuit structure, the switching noise and the control of the wave pattern formation.