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Production of fullerene ions by combining of plasma sputtering with laser ablation

プラズマスパッタリングとレーザーアブレーションによるフラーレンイオンの生成

山田 圭介; 齋藤 勇一; 横田 渉

Yamada, Keisuke; Saito, Yuichi; Yokota, Wataru

A C$$_{60}$$$$^{+}$$ production with combination of plasma sputtering and laser ablation was carried out. A C$$_{60}$$ sample put in an electron cyclotron resonance type ion source was negatively biased and sputtered by argon plasma. A beam current of C$$_{60}$$$$^{+}$$ decreased rapidly and recovered transiently by a single laser shot for ablation of the thin sample surface on the sputtered area. The time variation of beam current with laser shots at few-minute intervals is reported.

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パーセンタイル:92.51

分野:Instruments & Instrumentation

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