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Defect levels in high purity semi-insulating 4H-SiC studied by alpha particle induced charge transient spectroscopy

Iwamoto, Naoya; Onoda, Shinobu; Fujita, Natsuko ; Makino, Takahiro; Oshima, Takeshi

We have studied defect levels in Schottky barrier diodes (SBDs) made of high purity semi-insulating 4H silicon carbide substrates by alpha particle induced charge transient spectroscopy. A shallow defect level with the activation energy around 0.3 eV is found in all SBDs annealed at temperatures from 1400 to 1600 $$^{circ}$$C. Some other defect levels lying at deeper in the bandgap are found only in SBDs annealed at 1400 and 1500 $$^{circ}$$C. We also found that the series resistance of SBDs decreases with increasing of annealing temperature. The decrease of series resistance seems to be corresponding to the removal of deep levels.

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