Evaluation of interfaces of Fe $_{3}$ Si epitaxially grown on Si(111) with ion channeling

Kawakubo, Yuki*; Noguchi, Masaya*; Hirata, Tomoaki*; Maeda, Yoshihito; Sakai, Seiji; Narumi, Kazumasa

no abstracts in English

Language	:	Japanese
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Meeting title	:	第8回高崎量子応用研究シンポジウム
Held date	:	2013/10
Location (city)	:	高崎
Location (country)	:	日本
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Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
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Cooperating Institute	:	九州工業大学

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Registration No. : BB20131940
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Evaluation of interfaces of FeSi epitaxially grown on Si(111) with ion channeling

Evaluation of interfaces of Fe $_{3}$ Si epitaxially grown on Si(111) with ion channeling