Structure of ultra-thin silicon film on HOPG studied by polarization-dependence of X-ray absorption fine structure

Baba, Yuji  ; Shimoyama, Iwao   ; Hirao, Norie; Sekiguchi, Tetsuhiro  

Structures of mono-layered silicon on a highly oriented pyrolytic graphite (HOPG) have been investigated by X-ray photoelectron spectroscopy and X-ray absorption near edge structure (XANES). For the Si K-edge XANES spectrum of the 0.15 mono-layered film, two distinct peaks were observed, which were assigned to the resonant excitations from the Si 1s into the valence unoccupied orbitals with and characters. On the basis of the polarization dependences of the peak intensities, it was concluded that a part of the Si film lies flat on the HOPG surface, which supports the existence of two-dimensional graphene-like structure in mono-layered silicon.